Liquid flow control for film deposition
AssigneeMPS Corporation
InventorsThuc M. Dinh, Benjamin Y. H. Liu, Yamin Ma
Life of this patent
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AssigneeMPS Corporation
InventorsThuc M. Dinh, Benjamin Y. H. Liu, Yamin Ma
Estimating the term…
An apparatus for controlling liquid flow wherein the apparatus comprises an orifice and an adjacent flexible diaphragm separated from each other by a gap through which a liquid flows. The diaphragm is sufficiently flexible to vary the gap thereby controlling the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid flowing through the orifice. A method for controlling liquid flow through the apparatus comprises flexing said diaphragm to vary a size of the gap to control the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid from flowing through the orifice.
An apparatus for controlling liquid flow comprising an orifice and an adjacent flexible diaphragm separated from each other by a gap through which a liquid flows, said diaphragm being sufficiently flexible to vary the gap for controlling the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid flowing through the orifice and a spring to exert a force on said flexible diaphragm for positive liquid flow shut off;
A method for controlling liquid flow through an apparatus comprising an orifice and an adjacent flexible diaphragm separated from each other by a gap through which a liquid flows, the orifice comprising a liquid outlet substantially centered within a gas flow passageway outlet, the method comprising:
Dependencies are inferred from the claim text.