Electro-optic device and method for manufacturing the same
AssigneesNederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO, Koninklijke Philips Electronics N.V.
InventorsAntonius Maria Bernardus van Mol, Joanne Sarah Wilson, Chia-Chen Fan, Herbert Lifka, Erik Dekempeneer, Edward Willem Albert Young
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Abstract
An electro-optic device may include a substrate that supports a first and a second electrode, a functional structure including at least one functional layer that is electrically coupled to the electrodes, and an etched metal structure electrically coupled to at least one of the electrodes.
Claims15
Electro-optic device, comprising:
- a substrate that supports a first electrode and a second electrode;
- a functional structure comprising at least one functional layer, that is electrically coupled to said first and second electrodes;
- and
- an etched metal structure being electrically coupled to at least one of the electrodes, said at least one of the electrodes being formed as a layer, wherein a surface of the etched metal structure directly contacts the layer, wherein said layer is a transparent conductive electrode that is attached directly to ribs of the etched metal structure.
Method of manufacturing an electro-optic device comprising the following subsequent steps of:
- providing a first, metal substrate;
- providing a second substrate;
- and
- selectively etching the metal substrate to form an etched metal structure,
- wherein the first metal substrate is provided with a transparent electrically conductive layer before the step of selectively etching the metal substrate and wherein the first metal substrate is provided with a transparent electrically conductive layer before the step of providing a second substrate and that the transparent electrically conductive layer is applied by an APCVD process.
Method of manufacturing an electro-optic device comprising the following subsequent steps of:
- providing a first, metal substrate;
- providing a second substrate;
- selectively etching the metal substrate to form an etched metal structure;
- and
- depositing a functional structure,
- wherein the step of selectively etching the metal substrate is proceeded with a step of homogeneously reducing a thickness of the metal substrate.
Method of manufacturing an electro-optic device comprising the following subsequent steps of:
- providing a first, metal substrate;
- providing a second substrate;
- selectively etching the metal substrate to form an etched metal structure;
- and
- depositing a functional structure,
- wherein the step of selectively etching the metal substrate is succeeded with a step of homogeneously reducing a thickness of the metal substrate.
Method of manufacturing an electro-optic device comprising the following subsequent steps of:
- providing a first, metal substrate;
- providing a second substrate;
- selectively etching the metal substrate to form an etched metal structure;
- and
- depositing a functional structure,
- wherein the second substrate is removed after the etched metal structure is embedded into a third substrate, and wherein the functional structure is applied at the place of the second substrate.
Method of manufacturing an electro-optic device comprising the following subsequent steps of:
- providing a first, metal substrate;
- providing a second substrate;
- selectively etching the metal substrate to form an etched metal structure;
- and
- depositing a functional structure,
- wherein the second substrate is directly applied at the first, metal substrate.
Dependencies are inferred from the claim text.