Charged particle beam lithography apparatus and method, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorToshiro Yamanaka
Life of this patent
Estimating the term…
Abstract
A lithograph apparatus that performs writing on a substrate with a plurality of charged particle beams. A blanking deflector array blanks the plurality of charged particle beams. An aperture array blocks n charged particle beam deflected by the blanking deflector array. A sealing mechanism seals an opening or at least one of the blanking deflector array and the aperture array with a shielding material that shields a charged particle beam. A moving mechanism moves the substrate so that the writing is performed with a blankable charged particle beam instead of an unblankable charged particle beam shielded by the shielding material.
Claims16
A lithography apparatus that performs writing on a substrate with a plurality of charged particle beams, the apparatus comprising:
- a blanking deflector array for blanking the plurality of charged particle beams;
- an aperture array configured to block a charged particle beam deflected by the blanking deflector array;
- a sealing mechanism configured to seal an opening of at least one of the blanking deflector array and the aperture array with a shielding material that shield is a charged particle beam;
- and
- a moving mechanism for moving the substrate so that the writing is performed with a blankable charged particle beam instead of an unblankable charged particle beam shielded by the shielding material.
A writing method of performing writing on a substrate with a plurality of charged particle beams, the method comprising:
- sealing an opening, corresponding to an unblankable charged particle beam, of at least one of a blanking deflector array for blanking the plurality of charged particle beams and an aperture array configured to block a charged particle beam deflected by the blanking deflector array with a shielding material that shields a charged particle beam;
- and
- moving the substrate so that the writing is performed with a blankable charged particle beam instead of the unblankable charged particle beam shielded by the shielding material.
A method of manufacturing an article, the method comprising:
- (a) performing writing on a substrate with a lithography apparatus;
- and
- (b) developing the substrate, on which the writing has been performed, to manufacture the article,
- wherein the lithography apparatus performs writing on the substrate with a plurality of charged particle beams, the apparatus including:
- (i) a blanking deflector array for blanking the plurality of charged particle beams;
- (ii) an aperture array configured to block a charged particle beam deflected by the blanking deflector array;
- (iii) a sealing mechanism configured to seal an opening of at least one of the blanking deflector array and the aperture array with a shielding material that shields a charged particle beam;
- and
- (iv) a moving mechanism for moving the substrate so that the writing is performed with a blankable charged particle beam instead of an unblankable charged particle beam shielded by the shielding material.
A method of manufacturing an article, the method comprising:
- (a) performing writing on a substrate with a writing method;
- and
- (b) developing the substrate, on which the writing has been performed, to manufacture the article,
- wherein the writing method performs writing on the substrate with a plurality of charged particle beams, the writing method including:
- (i) sealing an opening, corresponding to an unblankable charged particle beam, of at least one of a blanking deflector array for blanking the plurality of charged particle beams and an aperture array configured to block a charged particle beams deflected by the blanking deflector array with a shielding material that shields a charged particle beam;
- and
- (ii) moving the substrate so that the writing is performed with a blankable charged particle beam instead of the unblankable charged particle beam shielded by the shielding material.
A lithography apparatus that performs writing on a substrate with a plurality of charged particle beams, the apparatus comprising:
- a blanking array for blanking the plurality of charged particle beam;
- a sealing mechanism configured to seal an opening of the blanking array with a shielding material that shields a charged particle beam;
- and
- a moving mechanism for moving the substrate so that the writing as performed with a blankable charged particle beam instead of an unblankable charged particle beam shielded by the shielding material.
A writing method of performing writing on a substrate with a plurality of charged particle beams, the method comprising:
- sealing an opening, corresponding to an unblankable charged particle beam, of a blanking array for blanking the plurality of charged particle beams with a shielding material that shields a charged particle beam;
- and
- moving the substrate so that the writing is performed with a blankable charged particle beam instead of the unblankable charged particle beam shielded by the shielding material.
A method of manufacturing an article, the method comprising:
- (a) performing writing on a substrate with a lithography apparatus;
- and
- (b) developing the substrate, on which the writing has been performed, to manufacture the article,
- wherein the lithography apparatus performs writing on the substrate with a plurality of charged particle beams, the apparatus including:
- (i) a blanking array for blanking the plurality of charged particle beams;
- (ii) a sealing mechanism configured to seal an opening of the blanking array with a shielding material that shields a charged particle beam;
- and
- (iii) a moving mechanism for moving the substrate so that the writing is performed with a blankable charged particle beam instead of an unblankable charged particle beam shielded by the shielding material.
A method of manufacturing an article, the method comprising:
- (a) performing writing on a substrate with a writing method;
- and
- (b) developing the substrate, on which the writing has been performed, to manufacture the article,
- wherein the writing method performs writing on the substrate with a plurality of charged particle beams, the writing method including:
- (i) sealing an opening, corresponding to an unblankable charged particle beam, of a blanking array for blanking the plurality of charged particle beams with a shielding material that shields a charged particle beam;
- and
- (ii) moving the substrate so that the writing is performed with a blankable charged particle beam instead of the unblankable charged particle beam shielded by the shielding material.
Dependencies are inferred from the claim text.