Solder mask with anchor structures
AssigneesATI Technologies ULC, Advanced Micro Devices, Inc.
InventorsAndrew K W Leung, Roden R. Topacio, Yu-Ling Hsieh, Yip Seng Low
Life of this patent
Estimating the term…
Abstract
Various substrates or circuit boards for receiving a semiconductor chip and methods of processing the same are disclosed. In one aspect, a method of manufacturing is provided that includes forming a first opening in a solder mask positioned on a side of a substrate. The first opening does not extend to the side. A second opening is formed in the solder mask that extends to the side. The first opening may serve as an underfill anchor site.
Claims12
A method of manufacturing, comprising:
- forming a first opening in a solder mask positioned on a side of a circuit board, the first opening not extending to the side, the solder mask including a photoactive compound;
- forming a second opening in the solder mask that extends to the side;
- and
- whereby the first and second openings being formed by lithographically patterning including masking first and second portions of the solder mask, exposing the solder mask with a first light dosage to leave the first and second portions uncured, masking the second portion but not the first portion of the solder mask, exposing the first portion of the solder mask with a second light dosage smaller than the first light dosage to leave a region of the first portion proximate the side uncured, and developing the solder mask to form the first and second openings.
A method of manufacturing, comprising:
- coupling a semiconductor chip to a side of a circuit board, the side including a solder mask having photoactive compound, a first opening not extending to the side and a second opening extending to the side, the first and second openings being photolithographically patterned by masking first and second portions of the solder mask, exposing the solder mask with a first light dosage to leave the first and second portions uncured, masking the second portion but not the first portion of the solder mask, exposing the first portion of the solder mask with a second light dosage smaller than the first light dosage to leave a region of the first portion proximate the side uncured, and developing the solder mask to form the first and second openings;
- and
- placing an underfill between the semiconductor chip and the solder mask, a portion of the underfill projecting into the first opening.
A method of manufacturing, comprising:
- forming a first opening in a solder mask positioned on a side of a circuit board, the first opening not extending to the side, the solder mask including a photoactive compound;
- forming a second opening in the solder mask that extends to the side;
- and
- wherein the forming of the first and second openings includes photolithographically patterning the first and second openings by masking first and second portions of the solder mask, exposing the solder mask with a first light dosage to leave the first and second portions uncured, masking the second portion but not the first portion of the solder mask, exposing the first portion of the solder mask with a second light dosage smaller than the first light dosage to leave a region of the first portion proximate the side uncured, and developing the solder mask to form the first and second openings.
A method of manufacturing, comprising:
- forming a first opening in a solder mask positioned on a side of a circuit board, the first opening not extending to the side, the solder mask including a photoactive compound;
- forming a second opening in the solder mask that extends to the side;
- and
- whereby the first and second openings being formed by photolithographically patterning, the photolithographically patterning including masking first and second portions of the solder mask with a mask comprising a first opaque structure having a first lateral dimension and a second opaque structure having a second lateral dimension, exposing the solder mask with light to cure the second portion, wherein the first lateral dimension is selected to enable the light to interact inside the solder mask to leave a region of the first portion proximate the side uncured, and developing the solder mask to form the first and second openings.
A method of manufacturing, comprising:
- coupling a semiconductor chip to a side of a circuit board, the side including a solder mask having a photoactive compound, a first opening not extending to the side and a second opening extending to the side, the first and second openings being photolithographically patterned by masking first and second portions of the solder mask with a mask comprising a first opaque structure having a first lateral dimension and a second opaque structure having a second lateral dimension, exposing the solder mask with light to cure the second portion, wherein the first lateral dimension is selected to enable the light to interact inside the solder mask to leave a region of the first portion proximate the side uncured, and developing the solder mask to form the first and second openings;
- and
- placing an underfill between the semiconductor chip and the solder mask, a portion of the underfill projecting into the first opening.
Dependencies are inferred from the claim text.