Negative resist composition, method of forming resist pattern and polymeric compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsAbe Sho, Shiono Daiju, Hirano Tomoyuki, Dazai Takahiro
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Abstract
A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.
Claims12
A negative resist composition comprising an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C),
- said alkali-soluble resin component (A) comprising a polymeric compound (F) having a structural unit (f1) containing a base dissociable group represented by formula (II-1) or (II-2) shown below and a structural unit (f2) containing a cross-linking group-containing group:
- wherein each R2 independently represents a fluorinated saturated hydrocarbon group or a fluorinated, unsaturated hydrocarbon group.
A polymeric compound comprising a structural unit (f1) represented by general formula (f1-1) or (f1-2) shown below and a structural unit (f2) containing a cross-linking group-containing group:
- wherein each R independently represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms;
- X represents a divalent organic group;
- Aaryl represents an aromatic cyclic group which may have a substituent;
- X01 represents a single bond or a divalent linking group;
- and each R2 independently represents an organic group having a fluorine atom.
Dependencies are inferred from the claim text.