Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

An actinic ray-sensitive or radiation-sensitive resin composition, comprising:

• (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid;
• and
• (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups represented by —COO— in the structure represented by formula (KA-1) or (KB-1):
• wherein Zka represents an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group, an amide group, an aryl group, a lactone ring group or an electron-withdrawing group, and when a plurality of Zka's are present, the plurality of Zka's are the same or different;
• each Zka may combine with every other Zka to form a ring;
• nka represents an integer of 0 to 10;
• each of Xkb1 and Xkb2 independently represents an electron-withdrawing group;
• each of nkb and nkb′ independently represents 0 or 1;
• and
• each of Rkb1 to Rkb4 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an electron-withdrawing group, at least two members of Rkb1, Rkb2 and Xkb1 may combine with each other to form a ring, and at least two members of Rkb3, Rkb4 and Xkb2 may combine with each other to form a ring,
• wherein:
• the resin (A) contains no fluorine atom and no silicon atom;
• the resin (A) includes a repeating unit represented by the following Formula (AI):
• wherein in formula (AI), Xa1 represents a hydrogen atom, a methyl group which may have a substituent, or a group represented by —CH2—R9;
• R9 represents a hydroxyl group or a monovalent organic group;
• T represents a single bond or a divalent linking group;
• each of Rx1 to Rx3 independently represents a linear or branched alkyl group or a monocyclic or polycyclic cycloalkyl group;
• and
• two members out of Rx1 to Rx3 may combine to form a monocyclic or polycyclic cycloalkyl group;
• and further wherein:
• the repeating unit (c) is (c*) a repeating unit having the at least two or more polarity conversion groups and having neither a fluorine atom nor a silicon atom, and
• the resin (C) further contains a repeating unit having at least either a fluorine atom or a silicon atom.

An actinic ray-sensitive or radiation-sensitive resin composition, comprising:

• (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid;
• and
• (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups represented by —COO— in the structure represented by formula (KA-1) or (KB-1):
• wherein Zka represents an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group, an amide group, an aryl group, a lactone ring group or an electron-withdrawing group, and when a plurality of Zka's are present, the plurality of Zka's are the same or different;
• each Zka may combine with every other Zka to form a ring;
• nka represents an integer of 0 to 10;
• each of Xkb1 and Xkb2 independently represents an electron-withdrawing group;
• each of nkb and nkb′ independently represents 0 or 1;
• and
• each of Rkb1 to Rkb4 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an electron-withdrawing group, at least two members of Rkb1, Rkb2 and Xkb1 may combine with each other to form a ring, and at least two members of Rkb3, Rkb4 and Xkb2 may combine with each other to form a ring,
• wherein:
• the resin (A) contains no fluorine atom and no silicon atom;
• the resin (A) includes a repeating unit represented by the following Formula (AI):
• wherein in formula (AI), Xa1 represents a hydrogen atom, a methyl group which may have a substituent, or a group represented by —CH2—R9;
• R9 represents a hydroxyl group or a monovalent organic group;
• T represents a single bond or a divalent linking group;
• each of Rx1 to Rx3 independently represents a linear or branched alkyl group or a monocyclic or polycyclic cycloalkyl group;
• and
• two members out of Rx1 to Rx3 may combine to form a monocyclic or polycyclic cycloalkyl group;
• and
• the repeating unit (c) has a structure represented by the following formula (KY-1):
• wherein each of Rky1 and Rky4 independently represents a hydrogen atom, a halogen atom, an alkyl group, a cycloalkyl group, a carbonyl group, a carbonyloxy group, an oxycarbonyl group, an ether group, a hydroxyl group, a cyano group, an amide group or an aryl group, Rky1 and Rky4 may be bonded to the same atom to form a double bond;
• each of Rky2 and Rky3 independently represents an electron-withdrawing group, or R1 and Rky2 are combined to form a lactone ring and at the same time, Rky3 is an electron-withdrawing group;
• at least two members of Rky1, Rky2 and Rky4 may combine with each other to form a monocyclic or polycyclic structure;
• and
• Rkb1 to Rkb4, nkb and nkb′ have the same meanings as in formula (KB-1).