Highly dilutable polishing concentrates and slurries

A method of preparing a chemical mechanical polishing slurry, comprising:

• adding water and oxidizer to a concentrate, wherein said concentrate comprises:
• about 0.5 wt % to about 10 wt %, based on the total weight of the concentrate, of an abrasive;
• about 1 wt % to about 20 wt %, based on the total weight of the concentrate, of a complexing agent;
• and
• a corrosion inhibitor,
• wherein said water and said oxidizer are added to said concentrate in an amount governed by the formula:
• 0.8≦[oxidizer]/f≦2.0,
• wherein ƒ=A+B*[complexing agent]C,
• wherein A is between 0.35 and 0.8, B is between 0.3 and 0.5, and C is about 1, and
• [oxidizer] and [complexing agent] are the amounts of the oxidizer and complexing agent in the chemical mechanical polishing slurry, respectively, to form the chemical mechanical polishing slurry.