Method of producing substrate for liquid ejection head
AssigneeCanon Kabushiki Kaisha
InventorsKenta Furusawa, Shuji Koyama, Hiroyuki Abo, Taichi Yonemoto
Life of this patent
Estimating the term…
Loading patent…
AssigneeCanon Kabushiki Kaisha
InventorsKenta Furusawa, Shuji Koyama, Hiroyuki Abo, Taichi Yonemoto
Estimating the term…
A substrate for a liquid ejection head, including: forming a sacrifice layer on a first surface of a silicon substrate in a region in which a liquid supply port is to open, the sacrifice layer containing aluminum which is selectively etched with respect to the silicon substrate; forming an etching mask on a second surface which is a rear surface of the first surface of the silicon substrate, the etching mask having an opening corresponding to the sacrifice layer; a first etching step of etching the silicon substrate by using the etching mask as a mask and by using a first etchant containing 8 mass % or more and less than 15 mass % of tetramethylammonium hydroxide; and after the first etching step, a second etching step of removing the sacrifice layer by using a second etchant containing 15 mass % or more and 25 mass % or less of tetramethylammonium hydroxide.
A method of producing a substrate for a liquid ejection head including a liquid supply port formed therein, comprising:
Dependencies are inferred from the claim text.