Plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber configured in a vertically two-divided configuration of an upper chamber and a lower chamber, the lower chamber having a substrate disposed therein;
• gas supply mechanism for supplying a processing gas into the upper chamber;
• plasma generating mechanism for forming a plasma from a processing gas supplied into the upper chamber;
• and
• voltage applying mechanism for applying high-frequency voltage to the plasma generating mechanism,
• the lower chamber having an inner space open at a top thereof, the upper chamber having an inner space open at a bottom thereof, said inner spaces communicating with each other,
• wherein the plasma processing apparatus further comprises
• an elevating board which is disposed horizontally and provided to be vertically movable and to which at least a part of members configuring the upper chamber are connected,
• elevating mechanism for supporting and moving up and down the elevating board, and
• at least three fixing mechanisms, first, second and third fixing mechanisms, for fixing the upper chamber;
• the upper chamber is configured from at least an annular plate wherein a lower surface on an outer peripheral side of which;
• is in contact with an upper portion of the lower chamber, a sidewall member which is formed in a hollow cylindrical shape and a lower end portion of which is placed on the annular plate, and a top plate which is placed on an upper end portion of the sidewall member;
• the elevating board has a vertically penetrating through hole having a size that the top plate can pass therethrough, and the elevating board is disposed at a position wherein the at least part of members configuring the upper chamber can pass through the vertically penetrating through hole in the vertical direction;
• the plasma generating mechanism is disposed outside an outer periphery of the sidewall member in a radial direction and fixed on a lower surface of the elevating board;
• the first fixing mechanism is configured to connect and fix the elevating board and the top plate with a first element partially disposed on an upper side of the elevating board and the top plate, and the first fixing mechanism is capable of releasing the connection between the elevating board and the top plate;
• the second fixing mechanism is configured to connect and fix the elevating board and the annular plate with a second element partially disposed on an upper side of the elevating board and the annular plate, and the second fixing mechanism is capable of releasing the connection between the elevating board and the annular plate;
• and
• the third fixing mechanism is configured to fix the annular plate to the lower chamber with a third element partially disposed on an upper side of the annular plate, and the third fixing mechanism is capable of releasing the fix between the annular plate and the lower chamber.