US 8,739,429 B2 · Systems and methods for drying a rotating substrate

Abstract

A system for drying a surface of a substrate is provided. The system for drying a surface of a substrate comprising: a rotary support; a first dispenser fluidly coupled to a source of liquid, the first dispenser positioned above the surface of the substrate so as to be capable of applying a film of the liquid to the surface of the substrate; a second dispenser fluidly coupled to a source of drying fluid with a supply line, the second dispenser positioned above the surface of the substrate so as to be capable of applying the drying fluid to the surface of the substrate; and a proportional valve operably coupled to the supply line between the second dispenser and the source of drying fluid, the proportional valve capable of being incrementally adjusted from a closed position to an open position.

Claims13

Dependent claims

A system for drying a surface of a substrate comprising:

a rotary support;
a first dispenser fluidly coupled to a source of liquid, the first dispenser positioned above the surface of the substrate for applying a film of the liquid to the surface of the substrate;
a second dispenser fluidly coupled to a source of drying fluid with a supply line, the second dispenser positioned above the surface of the substrate for applying the drying fluid to the surface of the substrate, wherein the liquid and the drying fluid are separately applied to the surface of the substrate via the first and second dispensers;
and
a proportional valve operably coupled to the supply line between the second dispenser and the source of drying fluid, the proportional valve capable of being incrementally adjusted from a closed position to an open position.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

13/633,843Filed 2 Oct 2012 · continuation

Priority

18 Jan 2006

Published

US 2013/0167393 A14 Jul 2013

Granted

3 Jun 2014

Term ends

Not estimatedThe source records don’t support an estimate.

Classification11 codes

H10P 72/0408
For cleaning followed by drying, rinsing, stripping, blasting or the like: for drying
H10P 72/0406
Apparatus for fluid treatment: for cleaning followed by drying, rinsing, stripping, blasting or the like
H10P 72/0414
For wet cleaning or washing: using mainly spraying means, e.g. nozzles
C11D 2111/20
Hard surfaces: industrial or commercial equipment, e.g. reactors, tubes or engines

Family

Application60/759,948Us provisional application · filed 18 Jan 2006

Application60/839,487Us provisional application · filed 23 Aug 2006

Application11/624,445Parent of this continuation · filed 18 Jan 2007

Application12/685,935Parent of this continuation · filed 12 Jan 2010

US 7,644,512 B1Parent of this continuation · filed 12 Jan 2010

Application13/296,760Parent of this continuation · filed 15 Nov 2011

US 8,056,253 B2Parent of this continuation · filed 15 Nov 2011

US 8,276,291 B2Parent of this continuation · filed 2 Oct 2012

US 2013/0167393 A1Pre-grant publication · published 4 Jul 2013

US 2010/0293806 A1Published application

US 2012/0061806 A1Published application

US 8,739,429 B2This patent

From the US filing history. Foreign family members aren’t listed.

Systems and methods for drying a rotating substrate

Life of this patent

Systems and methods for drying a rotating substrate

Life of this patent

Abstract

Claims13