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US 8,713,505 B2Granted
Pattern generation method and pattern generation program
AssigneeFujitsu Semiconductor Limited
InventorKoji Hosono
Life of this patent
Estimating the term…
Abstract
In a first process of a pattern generation method, a first segment to be handled which is not on a grid is extracted. In a second process, a second segment opposite to the first segment is extracted. In a third process, whether the second segment is on the grid is determined. In FIG. 1A, the second segment is not on the grid. Therefore, in a fourth process the first segment is shifted onto the grid under a determined condition. In addition, the second segment is shifted onto the grid so that line width between the first segment and the second segment is closest to target line width.
Claims5
A pattern generation method comprising:
- extracting a first segment which is not on grids by a segment extraction unit;
- extracting a second segment opposite to the first segment by the segment extraction unit;
- determining whether the second segment is on the grids by a determination unit;
- selecting, from the grids, a first grid which is adjacent to the first segment and a second grid which is adjacent to the second segment so that a space between the first grid and the second grid is closest to a target line width which is a line width between the first segment and the second segment by a grid shift unit, if the second segment is not on the grids;
- and
- shifting the first segment onto the first grid and the second segment onto the second grid by the grid shift unit, wherein:
- the shifting of the first segment and the second segment includes,
- obtaining a space between each of the grids adjacent to the first segment and each of the grids adjacent to the second segment;
- comparing the space between each of the grids adjacent to the first segment and each of the grids adjacent to the second segment with the target line width;
- and
- selecting the first grid and the second grid from each of the grids adjacent to the first segment and each of the grids adjacent to the second segment respectively after the comparing.
8 more elements
A pattern generation method comprising:
- extracting a first segment which is not on grids by a segment extraction unit;
- extracting a second segment opposite to the first segment by the segment extraction unit;
- determining whether the second segment is on the grids by a determination unit;
- and
- shifting the first segment onto a first grid which is selected from the grids adjacent to the first segment and the second segment onto a second grid which is selected from the grids adjacent to the second segment by a grid shift unit so that a space between the first grid and the second grid is closest to a target line width which is a line width between the first segment and the second segment before shifting the first segment and the second segment, if the second segment is not on the grids, wherein:
- the shifting of the first segment and the second segment includes,
- obtaining a space between each of the grids adjacent to the first segment and each of the grids adjacent to the second segment;
- comparing the space between each of the grids adjacent to the first segment and each of the grids adjacent to the second segment with the target line width;
- and
- selecting the first grid and the second grid from each of the grids adjacent to the first segment and each of the grids adjacent to the second segment respectively after comparing.
7 more elements
A non-transitory computer-readable storage medium on which a pattern generation program is recorded, the program making a computer:
- extract a first segment which is not on grids;
- extract a second segment opposite to the first segment;
- determine whether the second segment is on the grids;
- select, from the grids, in the case of the second segment not being on the grids, a first grid which is adjacent to the first segment and a second grid which is adjacent to the second segment so that a space between the first grid and the second grid is closest to a target line width which is a line width between the first segment and the second segment;
- and
- shift the first segment onto the first grid and the second segment onto the second grid,
- wherein:
- the shift of the first segment and the second segment includes,
- obtaining a space between each of the grids adjacent to the first segment and each of the grids adjacent to the second segment;
- comparing the space between each of the grids adjacent to the first segment and each of the grids adjacent to the second segment with the target line width;
- and
- selecting the first grid and the second grid from each of the grids adjacent to the first segment and each of the grids adjacent to the second segment respectively after the comparing.
9 more elements
Dependencies are inferred from the claim text.