IC layout parsing for multiple masks
AssigneeMentor Graphics Corporation
InventorsAlexander Tritchkov, Emile Y. Sahouria, Le Hong
Life of this patent
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Abstract
A method for separating features in a target layout into different mask layouts for use in a photolithographic process. Features of a target layer are searched for features having a predefined shape. In one embodiment, portions of the feature having the predefined shape divided into two or more sub-features and at least one sub-feature are not considered when separating the features into two or more mask layouts. In another embodiment, features having a predefined shape are cut to form two or more sub-features and all features and sub-features are considered when separating the features of the target layout into the two or more mask layouts.
Claims19
A method of preparing layout data with a computer to create two or more mask layouts that produce a target pattern of features during a photolithographic process manufacturing process, comprising:
- receiving a target layout or a portion of the target layout into a memory device that defines features to be created with the photolithographic process;
- employing a computer to search the features in the target layout received in the memory device for features having a predefined shape;
- isolating a portion of one or more of the features that have a predefined shape;
- and
- supplying features in the target layout without the isolated portion to a coloring algorithm that assigns features of the target layout to a first mask layout or a second mask layout.
Dependencies are inferred from the claim text.