Lithographic apparatus and device manufacturing method
AssigneesASML Netherlands B.V., Carl Zeiss SMT GmbH
InventorsBob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
Life of this patent
Estimating the term…
Abstract
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Claims14
A lithographic apparatus, comprising:
- a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate, the projection system having an optical axis along which the patterned beam is focused;
- a liquid supply system configured to fill a space between the projection system and the substrate with a liquid;
- and
- a controller configured to move the substrate, the patterning device, or both the patterning device and substrate in a direction other than orthogonal to the optical axis during projection of the patterned beam, through the liquid, onto the target portion of the substrate.
A device manufacturing method, comprising:
- providing a liquid to a space between a projection system of a lithographic apparatus and a substrate;
- patterning a radiation beam with a patterning device;
- projecting the patterned beam of radiation, using the projection system, through the liquid along an optical axis onto a target portion of the substrate;
- and
- moving the substrate, the patterning device, or both the patterning device and substrate in a direction other than orthogonal to the optical axis during projecting of the patterned beam, through the liquid, onto the target portion of the substrate.
A lithographic apparatus, comprising:
- a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate, the projection system having an optical axis along which the patterned beam is focused;
- a liquid supply system configured to fill a space between the projection system and the substrate with a liquid;
- and
- a controller configured to vibrate the substrate up and down in a direction substantially parallel to the optical axis at a frequency less than the laser frequency of the patterned beam throughout projection of the target portion through the liquid.
A device manufacturing method, comprising:
- providing a liquid to a space between a projection system of a lithographic apparatus and a substrate;
- projecting the patterned beam of radiation, using the projection system, through the liquid along an optical axis onto a target portion of the substrate;
- and
- vibrating the substrate up and down in a direction substantially parallel to the optical axis at a frequency less than the laser frequency of the patterned beam throughout projecting of the target portion through the liquid.
Dependencies are inferred from the claim text.