Methods and apparatus for performing multiple photoresist layer development and etching processes

A method for developing a photosensitive layer disposed on a substrate comprising:

• transferring a substrate having a photosensitive layer having exposed areas and non-exposed areas into an electron processing chamber;
• extracting electrons from a plasma formed from a gas mixture supplied into the electron processing chamber;
• and
• dry developing the photosensitive layer to remove the exposed areas of the photosensitive layer from the substrate or to remove the non-exposed area with the electrons extracted from the plasma.

A method for forming features on a substrate comprising:

• transferring a substrate into an electron processing chamber;
• wherein the substrate has a photosensitive layer disposed on a non-photosensitive polymer layer, the photosensitive layer having exposed areas and non-exposed areas;
• extracting electrons from a plasma;
• developing and removing the exposed areas in the photosensitive layer by using the electrons extracted from the plasma;
• trimming an edge profile of the developed photosensitive layer disposed on the substrate in the electron processing chamber by using the electrons extracted from the plasma;
• removing contaminants on the substrate by using the electrons extracted from the plasma;
• and
• etching the non-photosensitive polymer layer exposed by the developed photosensitive layer in the electron processing chamber by using the electrons extracted from the plasma.