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US 8,709,698 B2Granted
Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
AssigneeMaruzen Petrochemical Co., Ltd.
InventorsMinoru Iijima, Takanori Yamagishi
Life of this patent
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Abstract
A radical polymerization initiator represented by the following formula (G) in the formula (G), R71 and R72 are each a hydrocarbon group of 3 to 6 carbon atoms which may contain nitrogen atom; R73 and R74 are each a hydrogen atom or an acid-dissociating, dissolution-suppressing group; and at least one of R73 and R74 is an acid-dissociating, dissolution-suppressing group represented by the following formula (R78); and wherein R77 is a hydrocarbon group of 1 to 26 carbon atoms which may contain hetero atoms.
Claims1
A radical polymerization initiator represented by the following formula (G)
- in the formula (G), R71 and R72 are each a hydrocarbon group of 3 to 6 carbon atoms which may contain nitrogen atom;
- R73 and R74 are each a hydrogen atom or an acid-dissociating, dissolution-suppressing group;
- and at least one of R73 and R74 is an acid-dissociating, dissolution-suppressing group represented by the following formula (R78);
- and
- wherein R77 is a hydrocarbon group of 1 to 26 carbon atoms which may contain hetero atoms.
2 more elements
Dependencies are inferred from the claim text.