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US 8,709,683 B2Granted
Photomask blank, photomask blank manufacturing method, and photomask manufacturing method
AssigneeHoya Corporation
InventorMasaru Tanabe
Life of this patent
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Abstract
A photomask blank manufacturing method that forms, on a light-transmissive substrate, a thin film for forming a transfer pattern, thereby producing a thin-film coated substrate and then presses the thin-film coated substrate. The pressing is carried out, for example, by a cold isostatic pressing method in a range of 1000 to 10000 atmospheric pressure.
Claims11
A photomask comprising:
- a light-transmissive substrate;
- and
- a transfer pattern formed of a thin film on the light-transmissive substrate,
- wherein the thin film is made of a transition metal compound containing at least one of oxygen and nitrogen, and
- wherein when ArF excimer laser light is continuously irradiated on the photomask so that the total dose becomes 30 kJ/cm2, the thin film has the film density in which an increase in line width of the transfer pattern is 2 nm or less.
2 more elements
Dependencies are inferred from the claim text.