Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes
AssigneeApplied Materials, Inc.
InventorsBipin Thakur, Joe Griffith Cruz, Stefan Keller, Vikas Gujar, Ravindra Janu Patil
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Abstract
Methods for depositing films using hot wire chemical vapor deposition (HWCVD) processes are provided herein. In some embodiments, a method of operating an HWCVD tool may include providing hydrogen gas (H2) to a filament disposed in a process chamber of the HWCVD tool for a first period of time; and flowing current through the filament to raise the temperature of the filament to a first temperature after the first period of time.
Claims16
A method of operating a hot wire chemical vapor deposition (HWCVD) tool, comprising:
- providing hydrogen gas (H2) sufficient to blanket a tantalum filament disposed in a process chamber of the HWCVD tool for a first period of time selected to facilitate scavenging residual oxygen from the process chamber;
- and
- flowing current through the tantalum filament to raise the temperature of the tantalum filament to a first temperature after the first period of time, wherein the first temperature is a temperature at which a CVD deposition process is to subsequently occur.
A method of operating a hot wire chemical vapor deposition (HWCVD) tool, comprising:
- preconditioning a tantalum filament disposed in a process chamber of the HWCVD tool in a hydrogen gas (H2)-containing atmosphere sufficient to blanket the tantalum filament for a period of time selected to scavenge residual oxygen from the process chamber;
- flowing current through the tantalum filament to raise the temperature of the tantalum filament to a first temperature after preconditioning the tantalum filament, wherein the first temperature is a temperature at which a CVD deposition process is to subsequently occur;
- providing a process gas to the process chamber after the tantalum filament is at the first temperature;
- and
- depositing a material on the substrate using species decomposed from the process gas.
Dependencies are inferred from the claim text.