Method and system for providing high magnetic flux saturation CoFe films
AssigneeWestern Digital (Fremont), LLC
InventorsMing Sun, Jose A. Medina, Keith Y. Sasaki, Ming Jiang
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Abstract
A method and system plates CoFeX, where X is an insertion metal. The method and system include providing a plating solution including hydroxymethyl-p-tolylsulfone (HPT). The plating solution being configured to provide a CoFeX film having a high saturation magnetic flux density of greater than 2.3 Tesla and not more than 3 weight percent of X. The method and system also include plating the CoFeX film on a substrate in the plating solution. In some aspects, the plated CoFeX film may be used in structures such as main poles of a magnetic recording head.
Claims16
A method for plating CoFeX, where X is an insertion metal comprising:
- providing a plating solution including hydroxymethyl-p-tolylsulfone (HPT), the plating solution being configured to provide a CoFeX film having a high saturation magnetic flux density of greater than 2.3 Tesla and not more than 3 weight percent of X;
- and plating the CoFeX film on a substrate in the plating solution, wherein plating solution further comprises CoSO4, FeSO4, NaCl, boric acid, and sodium lauryl sulfate.
A method for providing a write head comprising:
- providing a plating solution including hydroxymethyl-p-tolylsulfone, CoSO4, FeSO4, NaCl, H3BO3, and sodium lauryl sulfate, the plating solution having a pH of not more than three and not less than two, the plating solution being configured to provide a CoFe film for a write pole having a high saturation magnetic flux density of greater than 2.35 Tesla, and having a composition of 60-65 weight percent of Fe;
- and plating the CoFe film for the write head on a substrate in the plating solution.
Dependencies are inferred from the claim text.