Maskless exposure apparatus and pattern compensation method using the same
AssigneeSamsung Electronics Co., Ltd.
InventorJeong Hyoun Sung
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Abstract
Disclosed herein is a method of compensating for distortion of an exposure pattern due to stage yawing in a maskless exposure apparatus using digital micromirror devices (DMDs). Requirements as to control performance of the stage yawing through the adjustment of sync signals (PEGs) to switch frames of the DMDs are eliminated, thereby reducing manufacturing costs of a large-sized stage. Also, distortion of an exposure pattern, which may occur due to uncompensated yawing, is digitally compensated by controlling the stage yawing, thereby achieving high-quality exposure.
Claims13
A maskless exposure apparatus comprising:
- a plurality of digital micromirror devices (DMDs) configured to selectively irradiate light on a substrate according to pattern information;
- a stage configured to move the substrate in a scanning direction;
- a position measurement unit configured to measure at least two positions of the stage;
- and
- a sync signal generation unit configured to,
- average the at least two positions,
- acquire middle position data of the stage from the average, and
- generate sync signals (PEGs) to adjust drive timings of the DMDs according to the middle position data of the stage.
A pattern compensation method of a maskless exposure apparatus, comprising:
- moving a stage having a substrate located thereon in a scanning direction;
- measuring at least two positions of the stage to calculate a yawing amount of the stage;
- averaging the at least two positions;
- acquire middle position data of the stage from the average,
- adjusting intervals of sync signals (PEGs) to drive a plurality of digital micromirror devices (DMDs) according to the middle position data of the stage;
- and
- transmitting the sync signals having the adjusted intervals to the DMDs to expose a pattern on the substrate.
Dependencies are inferred from the claim text.