Method for manufacturing light-emitting device and film formation substrate

A method for manufacturing a light-emitting device, comprising the steps of:

• disposing a first substrate and a second substrate so that one surface of the first substrate faces a deposition surface of the second substrate, wherein the first substrate includes a reflective layer including an opening, a light absorption layer covering the opening in the reflective layer over the reflective layer, a first protective layer including an opening in a position overlapped with the opening in the reflective layer over the light absorption layer, a second protective layer covering the opening in the first protective layer over the first protective layer, and a material layer including a light-emitting material over the second protective layer;
• and
• forming an EL layer including the light-emitting material in a region overlapped with the opening in the reflective layer on the deposition surface of the second substrate by performing light irradiation from the other surface side of the first substrate,
• wherein the first and second protective layers have a lower heat conductivity than the reflective layer and the light absorption layer,
• wherein each of the first and second protective layers has a first region which is overlapped with the reflective layer and the second protective layer has a second region which is not overlapped with the reflective layer, and
• wherein the first region of the first protective layer is thicker than the second region of the second protective layer.

A method for manufacturing a light-emitting device, comprising the steps of:

• disposing a first substrate and a second substrate so that one surface of the first substrate faces a deposition surface of the second substrate, wherein the first substrate includes a reflective layer including an opening, a heat insulating layer including an opening in a position overlapped with the opening in the reflective layer over the reflective layer, a light absorption layer covering the opening in the reflective layer and the opening in the heat insulating layer over the heat insulating layer, a protective layer over the light absorption layer, and a material layer including a light-emitting material over the protective layer;
• and
• forming an EL layer including the light-emitting material in a region overlapped with the opening in the reflective layer and the opening in the heat insulating layer on the deposition surface of the second substrate by performing light irradiation from the other surface side of the first substrate,
• wherein the protective layer has a lower heat conductivity than the reflective layer and the light absorption layer,
• wherein the protective layer has a first region which is overlapped with the reflective layer and a second region which is not overlapped with the reflective layer, and
• wherein the first region is thicker than the second region.