Method of making electronic devices using selective deposition
AssigneeEastman Kodak Company
InventorsMitchell S. Burberry, David H. Levy
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Abstract
Electronic devices can be prepared by forming a patterned thin film on a suitable receiver substrate. A cyanoacrylate polymer is used as a deposition inhibitor material and applied first as a deposition inhibitor material. The deposition inhibitor material can be patterned to provide selected areas on the receiver substrate where the deposition inhibitor is absent. An inorganic thin film is then deposited on the receiver substrate using a chemical vapor deposition technique only in those areas where the deposition inhibitor material is absent. The cyanoacrylate polymer deposition inhibitor material can be applied by thermal transfer from a donor element to a receiver substrate before a patterned thin film is formed.
Claims20
A deposition method for forming a patterned thin film comprising:
- applying a composition comprising a deposition inhibitor material to a receiver substrate,
- simultaneously or subsequently to the applying step, patterning the deposition inhibitor material to provide selected areas on the receiver substrate where the deposition inhibitor material is absent, and
- depositing an inorganic thin film on the receiver substrate by chemical vapor deposition only in those areas where the deposition inhibitor material is absent,
- wherein the deposition inhibitor material is a polymer comprising recurring units represented by the following Structure (I):
- wherein R1 is hydrogen, an alkyl group, or a group as defined for R2, and
- R2 is a cyano, isocyanate, azide, chloro, nitro, phosphoric, heteroaryl, or —C(═X)—R3 wherein X is oxygen, sulfur, or N+(R)2, R3 is R, OR, OM+, OC(═O)OR, SR, NHC(═O)R, NHC(═O)N(R)2, N(R)2, or N+(R)3, M+ is an alkali or ammonium cation, and R is hydrogen, a halogen, or an alkyl or cycloalkyl group.
Dependencies are inferred from the claim text.