Liquid processing apparatus, liquid processing method, and storage medium
AssigneeTokyo Electron Limited
InventorsMitsunori Nakamori, Akira Fujita, Takayuki Toshima
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AssigneeTokyo Electron Limited
InventorsMitsunori Nakamori, Akira Fujita, Takayuki Toshima
Estimating the term…
A liquid processing apparatus processes an object to be processed W including a body part Wi and a plurality of projecting-shape parts Wm disposed on the body part Wi, with an inorganic film and a different film being laminated to each other. The liquid processing apparatus comprises: a support part 50 configured to support the body part Wi; a hydrophobic-liquid supply mechanism 30 configured to supply a hydrophobic liquid to the object to be processed W; and a rinse-liquid supply part 22 configured to supply a rinse liquid to the object to be processed W to which the hydrophobic liquid has been supplied. The hydrophobic-liquid supply mechanism 30 includes: a first hydrophobic-liquid supply part 32 configured to supply a first hydrophobic liquid for making hydrophobic the inorganic film; and a second hydrophobic-liquid supply part 37 configured to supply a second hydrophobic liquid for making hydrophobic the different film.
A liquid processing method configured to process an object to be processed including a body part and a plurality of projecting-shape parts disposed on the body part with an inorganic film and a metal film being laminated to each other,
Dependencies are inferred from the claim text.