Coating device and coating method
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTsutomu Sahoda, Futoshi Shimai, Akihiko Sato
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Abstract
A coating device includes a coating mechanism which includes nozzles for ejecting a liquid material onto front and rear surfaces of a substrate while rotating the substrate; and an adjusting mechanism which adjusts the coating state of the liquid material at the outer periphery of the substrate; wherein the adjusting mechanism includes a dip portion which dips the outer periphery of the substrate in a solution while rotating the substrate and dissolves; and a suction portion which suctions the vicinity of the outer periphery of the substrate after dipping in the solution.
Claims9
A coating method, comprising:
- ejecting a liquid material onto front and rear surfaces of a substrate through a nozzle while rotating the substrate in a state in which the front and rear surfaces of the substrate are disposed in a vertical direction;
- and
- adjusting a coating state of the liquid material at the outer periphery of the substrate,
- wherein the adjusting includes:
- dipping the outer periphery of the substrate in a solution while rotating the substrate in a state in which the front and rear surfaces of the substrate are disposed in a vertical direction to dissolve a thin film formed on the outer periphery of the substrate;
- and
- suctioning a vicinity of the outer periphery of the substrate after dipping in the solution.
Dependencies are inferred from the claim text.