Micro-conformal templates for nanoimprint lithography
AssigneeMolecular Imprints, Inc.
InventorsMichael N. Miller, Frank Y. Xu, Nicholas A. Stacey
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Abstract
A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.
Claims20
A nanoimprint lithography template comprising:
- a backing layer;
- a silicon-containing cured nanopatterned resist layer adhered to the backing layer;
- an oxidized layer on the surface of the silicon-containing cured nanopatterned resist layer, wherein the oxidized layer is formed by oxidizing the silicon-containing cured nanopatterned resist layer;
- wherein the elastic modulus of the oxidized layer exceeds the elastic modulus of the silicon-containing cured nanopatterned resist layer, and a thickness of the oxidized layer is at least 5 nm.
A nanoimprint lithography method comprising:
- selecting a backing layer;
- disposing a silicon-containing polymerizable material on the backing layer;
- contacting the silicon-containing polymerizable material with a patterned master nanoimprint lithography template;
- solidifying the silicon-containing polymerizable material to form a silicon-containing patterned layer adhered to the backing layer;
- separating the master nanoimprint template from the silicon-containing patterned layer;
- and
- oxidizing the surface of the silicon-containing patterned layer to form an oxidized layer with a thickness of at least 5 nm on the surface of the silicon-containing patterned layer.
A nanoimprint lithography template comprising:
- a backing layer;
- and
- a silicon-containing cured nanopatterned resist layer adhered to the backing layer, wherein the silicon-containing cured nanopatterned resist layer comprises an oxidized surface formed by oxidizing the silicon-containing cured nanopatterned resist layer, and the elastic modulus of the backing layer exceeds the elastic modulus of the silicon-containing cured nanopatterned resist layer,
- wherein the nanoimprint lithography template forms a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect, and wherein the nanoimprint lithography template shows no reduction in feature fidelity after multiple imprints.
Dependencies are inferred from the claim text.