Accurate deposition of nano-objects on a surface
AssigneeInternational Business Machines Corporation
InventorsUrs T Duerig, Felix Holzner, Cyrill Kuemin, Armin W. Knoll, Philip Paul, Heiko Wolf
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AssigneeInternational Business Machines Corporation
InventorsUrs T Duerig, Felix Holzner, Cyrill Kuemin, Armin W. Knoll, Philip Paul, Heiko Wolf
Estimating the term…
The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate. The invention also provides a semiconductor device which includes a substrate and nano-objects accurately disposed on the substrate.
A semiconductor device comprising:
A semiconductor device comprising:
Dependencies are inferred from the claim text.