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US 8,574,792 B2Granted
Photomask including super lens and manufacturing method thereof
AssigneeSamsung Display Co., Ltd.
InventorsJong Kwang Lee, Jin Ho Ju, Min Kang, Hyang-Shik Kong
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Abstract
A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.
Claims16
A photomask, comprising:
- a substrate including a main planar portion, protruding portions extending from the main planar portion, and open portions defined between the protruding portions;
- a mask pattern layer in the open portions, wherein the mask pattern layer fills the open portions defined between the protruding portions of the substrate;
- and
- a super lens on the substrate and the mask pattern layer.
1 more element
A photomask, comprising:
- a substrate;
- a mask pattern layer on the substrate;
- and
- a super lens disposed on the substrate and the mask pattern layer,
- wherein the super lens includes:
- a first negative refractive index layer having a negative refractive index, and comprising planar upper and lower sides, and
- a first negative refractive index sub-pattern layer having a negative refractive index, and comprising protruding portions spaced apart from each other and protruding from one of the planar upper side and the planar lower side of the first negative refractive index layer.
4 more elements
Dependencies are inferred from the claim text.