US 8,571,362 B1 · Forming optical device using multiple mask formation techniques

Abstract

An optical device includes a first region interfaced with a second region. The first region includes one or more surfaces that are formed using electron-beam lithography and the second region includes one or more surfaces that are formed using photolithography. A component crosses the interface and includes a first portion located in the first region and a second portion located in the second region. The component includes a light-signal carrying region that constrains light signals. The first portion includes a first taper that expands the light-signal carrying region as the component approaches the interface and the second portion includes a second taper that expands the light-signal carrying region as the component approaches the interface.

Claims17

Dependent claims

An optical device, comprising:

a waveguide on a base, the waveguide having an interface between a first portion and a second portion,
the first portion of the waveguide having one or more surfaces that each has features in accordance with a surface formed using a mask generated by electron-beam lithography,
the second portion of the waveguide having one or more surfaces that each has features in accordance with a surface formed using a mask generated by photolithography,
the first portion of the waveguide having a first taper that expands one or more dimensions of the waveguide as the first portion of the waveguide approaches the interface, and
the second portion of the waveguide having a second taper that expands one or more dimensions of the waveguide as the second portion of the waveguide approaches the interface.

2 more elements

Dependencies are inferred from the claim text.

Forming optical device using multiple mask formation techniques

Life of this patent

Forming optical device using multiple mask formation techniques

Life of this patent

Abstract

Claims17