Lithographic apparatus and control method

A lithographic apparatus comprising:

• a substrate table constructed to hold a substrate, the substrate table connected to a positioning device configured to move the substrate table in a scan direction and in a step direction;
• and
• a controller arranged to control a speed of the substrate table in at least the scan direction, the controller comprising:
• a first input configured to receive a first signal representative of a first time period (Tstep) of a movement of the substrate table in the step direction,
• a second input configured to receive a second signal representative of a distance (dscan) in the scan direction to be covered by the substrate table during a scan movement thereof,
• a third input configured to receive a third signal representative of an acceleration (ascan) of the substrate table in the scan direction,
• a fourth input configured to receive a fourth signal representative of a jerk (jscan) of the substrate table in the scan direction, and
• an output configured to provide an output signal to control the speed (Vscan) of the substrate table in the scan direction,
• wherein the controller is further arranged to
• calculate the speed (Vscan) of the substrate table in the scan direction from the first (Tstep), the second (dscan), the third signal (ascan) and the fourth signal (jscan), and
• compensate the output signal for the calculated speed (Vscan) of the substrate table.