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US 8,570,488 B2Granted
Transmitting optical element and objective for a microlithographic projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsWilfried Clauss, Michael Totzeck, Werner Mueller-Rissmann
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Abstract
A transmitting optical element adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material, with the polycrystalline material having crystallites with a cubic crystal structure, and with the mean crystallite size of these crystallites being at least micrometers, and at most micrometers.
Claims35
A system, comprising:
- a housing;
- an objective in the housing, the objective comprising a plurality of optical elements comprising a transmitting optical element composed of polycrystalline material having a refractive index of more than 1.7 for a wavelength of less than 200 nm;
- and
- an immersion liquid in the housing,
- wherein the transmitting optical element composed of polycrystalline material is closest to an image plane of the objective.
2 more elements
An apparatus, comprising:
- an illumination system;
- a device to hold a movable mask;
- and
- an objective comprising a transmitting optical element composed of polycrystalline material,
- wherein the polycrystalline material has a refractive index of more than 1.7 for a wavelength of less than 200 nm, and the apparatus is a microlithography projection exposure apparatus.
2 more elements
Dependencies are inferred from the claim text.