Lithographic apparatus and device manufacturing method

A lithographic projection apparatus comprising:

• a substrate table configured to hold a substrate;
• a projection system configured to project a patterned beam of radiation onto a target portion of the substrate;
• a liquid handling system configured to supply a liquid to a space between the projection system and the substrate table, the liquid handling system comprising a barrier member at least partly surrounding the space;
• a plurality of independently controllable thermal control devices in or on the barrier member, the thermal control devices being spaced apart;
• and
• a control system coupled to the plurality of thermal control devices and configured to control separately each of the thermal control devices.

A lithographic projection apparatus, comprising:

• a substrate table configured to hold a substrate;
• a projection system configured to project a patterned beam of radiation onto a target portion of the substrate;
• a liquid supply system configured to supply a liquid to a space through which the beam of radiation passes;
• a sensor, comprising a plurality of sensing elements or portions, configured to measure, as a function of position, a property of the liquid in the space including any one or more selected from the following:
• temperature, pressure, composition, refractive index and/or absorptivity;
• and
• a controller configured to control, based on the measured property, supply of the liquid to the space.