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US 8,569,854 B2Granted
Semiconductor imaging instrument and manufacturing method thereof, and camera and manufacturing method thereof
AssigneeSony Corporation
InventorYoshinori Uchida
Life of this patent
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Abstract
A semiconductor imaging instrument is disclosed, including a prescribed substrate, an imaging device array provided on the substrate and having plural semiconductor imaging devices and electrodes for outputting a signal charge upon photoelectric conversion of received light, and a color filter layer provided on the imaging device array, with an infrared light absorbing dye being contained in the color filter layer.
Claims17
A semiconductor imaging instrument comprising:
- a prescribed substrate;
- an imaging device array produced on the substrate and having plural semiconductor imaging devices and electrodes for outputting a signal charge upon photoelectric conversion of received light;
- a color filter layer provided on the imaging device array;
- and
- an infrared light absorbing dye being contained in the color filter layer,
- wherein a cyanine based dye which is configured by the following formula is used as the infrared light absorbing dye material:
3 more elements
Dependencies are inferred from the claim text.