Alkylsilane laminate, production method thereof and thin-film transistor

A thin-film transistor, having, on one surface of a substrate, a source electrode, a drain electrode, a gate electrode, a gate insulating film and an organic semiconductor film, said source electrode and said drain electrode being insulated from said gate electrode by said gate insulating film, and the current flowing from said source electrode to said drain electrode through said organic semiconductor being controlled by the voltage applied to said gate electrode,

• wherein said thin-film transistor further has an alkylsilane thin film, said substrate or gate insulating film has hydroxyl groups on the surface thereof, said alkylsilane thin film is formed on said substrate or gate insulating film having hydroxyl groups on the surface thereof, and the critical surface energy Ec of said alkylsilane thin film and the carbon number x of the alkylsilane satisfy the following formula (1):
• Ec≦29.00−0.63x (mN/m) (1);
• wherein said alkylsilane thin film is made of a trichloroalkylsilane or a trialkoxyalkylsilane as a raw material.