Extreme ultra violet light source apparatus
AssigneeGigaphoton Inc.
InventorsMasaki Nakano, Akira Endo
Life of this patent
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AssigneeGigaphoton Inc.
InventorsMasaki Nakano, Akira Endo
Estimating the term…
In an LPP type EUV light source apparatus, the intensity of radiated EUV light is stabilized by improving the positional stability of droplets. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply division including a target tank for storing a target material therein and an injection nozzle for injecting the target material in a jet form, for supplying the target material into the chamber; a charging electrode applied with a direct-current voltage between the target tank and itself, for charging droplets when the target material in the jet form injected from the injection nozzle is broken up into the droplets; a laser for applying a laser beam to the droplets of the target material to generate plasma; and a collector mirror for collecting extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.
An extreme ultra violet light source apparatus for generating extreme ultra violet light from plasma generated by irradiating a target material supplied to a region with a laser beam introduced from an external unit, said apparatus comprising:
An extreme ultra violet light source apparatus for generating extreme ultra violet light from plasma generated by irradiating a target material supplied to a region with a laser beam introduced from an external unit, said apparatus comprising:
Dependencies are inferred from the claim text.