Flash lamp annealing crystallization for large area thin films
AssigneeThe Trustees of Columbia University in the City of New York
InventorJames S. Im
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Abstract
The disclosed subject matter generally relates a method of irradiating a large area thin film with a pulsed light source. In some embodiments, the disclosed subject matter particularly relates to utilizing flash lamp annealing in combination with patterning techniques for making thin film devices. The flash lamp annealing can trigger lateral growth crystallization or explosive crystallization in large area thin films. In some embodiments, capping layers or proximity masks can be used in conjunction with the flash lamp annealing.
Claims24
A method of irradiating a large area film with a pulsed light source comprising:
- providing a large area film, having a first dimension and a second dimension, on a substrate;
- covering at least a portion of the large area film with a covering material, wherein the covering material has one or more exposure areas that expose one or more sections of the large area film;
- and
- irradiating the large area film and covering material with a pulsed light source under conditions to at least partially melt a portion of the large area film, wherein the irradiation area has a dimension at least substantially equal to a dimension of the large area film and the irradiating of the film causes crystallization to proceed from the interface between the exposed sections and the nonexposed sections of the large area film.
A method of irradiating a large area film using a pulsed light source comprising:
- providing a large area film, having a first dimension and a second dimension, on a substrate;
- covering the large area film with a capping layer having a pattern, wherein the pattern exposes one or more sections of the large area film;
- irradiating the large area film with a pulsed light source under conditions to at least partially melt a first portion of the large area film while a second portion of the large area film remains solid, wherein the irradiation area has a dimension at least substantially equal to a dimension of the large area film;
- and
- re-solidifying the first portion of the large area film to form a crystalline portion thereby releasing heat to melt an adjacent portion of the large area film.
Dependencies are inferred from the claim text.