Source/drain-to-source/drain recessed strap and methods of manufacture of same
AssigneeInternational Business Machines Corporation
InventorsBrent A. Anderson, Edward J. Nowak, Jed H. Rankin
Life of this patent
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AssigneeInternational Business Machines Corporation
InventorsBrent A. Anderson, Edward J. Nowak, Jed H. Rankin
Estimating the term…
A structure and a method of making the structure. The structure includes first and second semiconductor regions in a semiconductor substrate and separated by a region of trench isolation in the semiconductor substrate; a first gate electrode extending over the first semiconductor region; a second gate electrode extending over the second semiconductor region; a trench contained in the region of trench isolation and between and abutting the first and second semiconductor regions; and an electrically conductive strap in the trench, the strap electrically connecting the first and second semiconductor regions.
A method, comprising:
Dependencies are inferred from the claim text.