Composition for formation of top antireflective film, and pattern formation method using the composition

A composition for forming a top antireflective film, which comprises

• (A) at least one of fluorine-containing compounds wherein the fluorine-containing compound is a is a fluoropolymer containing a polymer unit represented by the formula (2) or a fluoropolymer containing a polymer unit represented by the formula (2) and a polymer unit represented by the formula (3):
• —[CF2CF(ORfCOOH)]— Formula (2)
• wherein Rf represents a linear or branched perfluoroalkylene group that may contain an ethereal oxygen atom;
• —[CF2CFX1]— Formula (3)
• wherein X1 represents a fluorine atom, a chlorine atom or a hydrogen atom;
• and
• (B) a quaternary ammonium compound represented by the formula (1):
• wherein at least one of R1, R2, R3 and R4 represents a hydroxyl group or an alkanol group, the others represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and X− represents a hydroxyl group wherein the ratio of moles of acid from the fluoropolymer to the number of moles of base from the quaternary ammonium compound is in the range of 1:0.01 to 1:1.00 and wherein a lowering of an application amount of the composition can be realized.