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US 8,568,908 B2Granted
Method for manufacturing magnetic film and magnetic film
AssigneeTDK Corporation
InventorsKei Hirata, Atsushi Yamaguchi, Shingo Miyata
Life of this patent
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Abstract
A method for manufacturing a magnetic film includes preparing a foundation layer containing a noble metal element and a base metal element, and depositing a plated layer of a magnetic material on the foundation layer by pulse plating.
Claims2
A thin-film magnetic head, comprising:
- a write element;
- a read element, and;
- a slider supporting said write element and said read element, wherein
- at least one of said write element and said read element includes a magnetic film including a foundation layer consisting of an alloy of a noble metal element and a base metal element, and a plated layer of a magnetic material substantially consisting of CoFe or NiFe formed on said foundation layer,
- wherein said foundation layer is selected from a combination group of (Ru, Ti),
- wherein a total amount of said base metal element in said foundation layer ranges from 5 to 20 atomic %, and
- wherein said foundation layer has a lower standard electrode potential than a foundation layer of only said noble metal element to suppress an occurrence of pinholes in said plated layer when said plated layer is formed on said foundation layer.
4 more elements
Dependencies are inferred from the claim text.