Back to results
US 8,558,987 B2Granted
Exposure apparatus and device fabrication method
AssigneeNikon Corporation
InventorMasaomi Kameyama
Life of this patent
Estimating the term…
Abstract
An immersion lithography system includes a wafer stage, a lens for projecting an image onto a wafer located on the wafer stage, an immersion fluid supply for supplying immersion fluid between the lens and the wafer, and a purge fluid conveying device for conveying about the supplied immersion fluid a purge fluid saturated with a component of the immersion fluid.
Claims15
An immersion lithography system comprising:
- a wafer stage;
- a lens for projecting an image onto a wafer located on the wafer stage;
- an immersion fluid supply system having a supply inlet for supplying immersion liquid between the lens and the wafer, the image being projected onto the wafer through the supplied immersion liquid covering a portion of a surface of the wafer;
- a purge fluid supply system for conveying a purge fluid saturated with a component of the immersion liquid to an area adjacent to, and in contact with, the supplied immersion liquid such that evaporation of the immersion liquid is suppressed;
- and
- a controller configured to control the purge fluid supply system to control a vapor pressure of the area.
3 more elements
A method of performing immersion photolithography comprising the steps of:
- locating an immersion liquid between a wafer and a lens;
- projecting an image onto the wafer through the immersion liquid;
- conveying a purge fluid saturated with a component of the immersion liquid to an area adjacent to, and in contact with, the immersion liquid, such that evaporation of the immersion liquid is suppressed;
- and
- controlling the conveying of the purge fluid with a controller to control a vapor pressure of the area, wherein
- the image is projected onto the wafer through supplied immersion liquid covering a portion of a surface of the wafer.
3 more elements
An immersion lithography system comprising:
- an enclosure that houses a wafer stage and a lens for projecting an image onto a wafer located on the wafer stage;
- an immersion fluid supply system having a supply inlet for supplying immersion liquid into the enclosure;
- a purge fluid supply system for conveying a purge fluid saturated with a component of the immersion liquid through the enclosure, such that evaporation of the immersion liquid is suppressed;
- and
- a controller configured to control the purge fluid supply system to control a vapor pressure within the enclosure, wherein
- the image is projected onto the wafer through the supplied immersion liquid covering a portion of a surface of the wafer.
3 more elements
A method of performing immersion photolithography comprising the steps of:
- providing an enclosure housing a lens;
- positioning within the enclosure a wafer such that the lens projects an image onto the wafer;
- maintaining within the enclosure an immersion liquid between the lens and the wafer;
- conveying through the enclosure a purge fluid saturated with a component of the immersion liquid, such that evaporation of the immersion liquid is suppressed;
- projecting the image onto the wafer through supplied immersion liquid covering a portion of a surface of the wafer;
- and
- controlling the conveying of the purge fluid with a controller to control a vapor pressure within the enclosure.
4 more elements
Dependencies are inferred from the claim text.