Exposure apparatus and device manufacturing method

A method comprising:

• exposing a substrate to a pattern using an apparatus;
• developing the exposed substrate;
• and
• processing the developed substrate to manufacture a device,
• wherein the apparatus includes a projection optical system, a stage configured to hold the substrate, and a measurement device configured to measure a position of a surface of the substrate in a direction of an optical axis of the projection optical system;
• measures the position with respect to each of a plurality of shot regions on the substrate by successively scanning in one scanning direction the plurality of shot regions relative to the measurement device, the plurality of shot regions being arrayed along the scanning direction;
• and moves the stage in accordance with the measured position and exposes each of the plurality of shot regions to the pattern via the projection optical system, the apparatus including:
• a controller configured to control the stage and the measurement device,
• wherein
• the controller is configured to generate a list of measurement points arranged, with respect to each of the plurality of shot regions, symmetrically with respect to a center of a shot region along the scanning direction at a predetermined pitch, and
• a control of the measurement device by the controller includes
• a first control which causes the measurement device to measure the position with respect to each of the measurement points included in the list, and
• a second control which causes the measurement device to measure the position with respect to each of measurement points to be obtained by excluding, from the list, at least one of a last measurement point with respect to which measurement is performed last in a first shot region and a first measurement point with respect to which measurement is performed first in a second shot region next to the first shot region,
• wherein the controller is configured to perform the first control if, in the list, a distance between the last measurement point in the first shot region and the first measurement point in the second shot region is not smaller than the predetermined pitch, and to perform the second control if at least, in the list, the distance is smaller than the predetermined pitch.