Method for producing a micromechanical and/or nanomechanical device with anti-bonding stops
AssigneeCommissariat a l'Energie Atomique
InventorStéphane Caplet
Life of this patent
Estimating the term…
Abstract
A method for producing a micromechanical and/or nanomechanical device includes partial etching of at least one sacrificial layer arranged between a first layer and a substrate, forming at least one cavity in which is arranged at least one portion of the sacrificial layer in contact with the first layer and/or the substrate. The method also includes chemical transformation of at least one wall of the first layer and/or the substrate in the cavity, delimiting at least one stop in the first layer and/or the substrate at the level of the portion of the sacrificial layer. The portion of the sacrificial layer and the chemically transformed wall of the first layer and/or the substrate is also eliminated.
Claims12
A method for producing a micromechanical and/or nano-mechanical device comprising:
- partial etching of at least one sacrificial layer arranged between a first layer and a substrate, forming at least one cavity in which is arranged at least one portion of the sacrificial layer in contact with the first layer and/or the substrate,
- chemically transforming:
- (i) at least a portion of a front face of the first layer,
- (ii) at least a portion of a wall defining an opening formed in the first layer, and
- (iii) at least one wall of the first layer, the substrate, or of both the first layer and the substrate defining an interior of the at least one cavity to form a protective layer covering the portion of the front face and the at least one wall facing the interior of the at least one cavity between the first layer and the substrate, delimiting at least one stop in the first layer and/or the substrate at a level of the portion of the sacrificial layer, wherein formation of the protective layer by said chemically transforming comprises thermal oxidation of the portion of the front face and the at least one wall, or deposition of a metal layer on the portion of the front face and the wall and a siliciding of the metal layer, and
- subsequent to the chemically transforming the portion of the front face and the at least one wall, eliminating said portion of the sacrificial layer and removing the protective layer covering the portion of the front face and the at least one wall to expose a smooth surface of the front face and the at least one wall and free the stop.
A method for producing a micromechanical and/or nano-mechanical device comprising:
- partial etching of at least one sacrificial layer arranged between a first layer and a substrate, forming at least one cavity in which is arranged at least one portion of the sacrificial layer in contact with the first layer, and/or the substrate,
- chemically transforming:
- (i) at least a portion of a front face of the first layer,
- (ii) at least a portion of a wall defining an opening formed in the first layer, and
- (iii) at least one wall of the first layer, the substrate, or of both the first layer and the substrate defining an interior of the at least one cavity to form a protective layer covering the portion of the front face and the at least one wall facing the interior of the at least one cavity between the first layer and the substrate, wherein said protective layer shields the portion of the front face and the at least one wall and protects against roughening of the portion of the front face and the at least one wall during a subsequent etching step performed to remove the protective layer, delimiting at least one stop in the first layer and/or the substrate at a level of the portion of the sacrificial layer, and
- subsequent to the chemically transforming the portion of the front face and the at least one wall, performing the subsequent etching step to eliminate said portion of the sacrificial layer and remove the protective layer covering the portion of the front face and the at least one wall to expose a smooth surface of the portion of the front face and the at least one wall shielded by the protective layer and free the stop.
Dependencies are inferred from the claim text.