Developable bottom antireflective coating compositions especially suitable for ion implant applications
AssigneeInternational Business Machines Corporation
InventorsWu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
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Abstract
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
Claims16
A developable bottom antireflective coating composition comprising:
- a polymer containing a backbone component, a pendant aromatic moiety, a pendant aliphatic alcohol moiety, and a pendant acid labile moiety, wherein the polymer becomes substantially insoluble in a resist casting solvent if subsequently baked at a temperature greater than about 150° C., and
- a solvent for the polymer, wherein the polymer comprises a first repeating unit having the structure:
- wherein R3 is selected from the group consisting of F, Br, CF3, CN, and H, and
- wherein R4 includes an aliphatic alcohol moiety.
A method of forming a developable bottom antireflective coating composition, said method comprising:
- forming a polymer containing a backbone component, a pendant aromatic moiety, a pendant aliphatic alcohol moiety, and a pendant acid labile moiety, wherein the polymer becomes substantially insoluble in a resist casting solvent if subsequently baked at a temperature greater than about 150° C.;
- and
- combining the polymer with a solvent for the polymer, wherein the polymer has a weight average molecular weight of about 1500-50000.
A method of forming a developable bottom antireflective coating composition, said method comprising:
- forming a polymer containing a backbone component, a pendant aromatic moiety, a pendant aliphatic alcohol moiety, and a pendant acid labile moiety, wherein the polymer becomes substantially insoluble in a resist casting solvent if subsequently baked at a temperature greater than about 150° C., and
- combining the polymer with a solvent for polymer, wherein the pendant acid labile moiety is selected from the group consisting of MethylAdamantylMethacrylate, EthylAdamantylMethacrylate, EthylCyclopentylMethacrylate, MethylCyclopentylMethacrylate, and tert-ButylAcrylate.
A developable bottom antireflective coating composition, comprising:
- a polymer containing a backbone component, a pendant aromatic moiety, a pendant aliphatic alcohol moiety, and a pendant acid labile moiety, wherein the polymer becomes substantially insoluble in a resist casting solvent if subsequently baked at a temperature greater than about 150° C., and
- a solvent for the polymer, wherein the polymer comprises a first repeating unit having the structure:
- wherein R3 is selected from the group consisting of F, Br, CF3, CN, and CH3,
- wherein R4 includes an aliphatic alcohol moiety,
- wherein the polymer comprises a second repeating unit having the structure:
- wherein Rl is selected from the group consisting of F, Br, CF3, CN, and CH3, and
- wherein R2 includes an aromatic moiety.
Dependencies are inferred from the claim text.