Method for the deposition of a Ruthenium containing film
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsJulien Gatineau, Christian Dussarrat
Life of this patent
Estimating the term…
Abstract
Disclosed are processes for depositing ruthenium containing films on substrates using an organometallic compound having the following formula: L-Ru—X (I) wherein L is a non-aromatic cyclic unsaturated hydrocarbon ligand (L), having at least six cyclic carbon atoms, said cycle being unsubstituted or substituted, and X is either a non aromatic cyclic unsaturated hydrocarbon ligand identical or different from (L), having at least six cyclic carbon atoms said cycle being unsubstituted or substituted or a cyclic or acyclic conjugated alkadienyl hydrocarbon ligand having from five to ten carbons atoms, said hydrocarbon ligand being unsubstituted or substituted.
Claims11
A process for the deposition of a ruthenium containing film on a substrate, comprising the steps of:
- a) providing at least one substrate into a reactor;
- b) introducing into the said reactor at least one organo-metallic compound of the formula (I):
- L-Ru—X (I)
- wherein:
- L is a non-aromatic cyclic unsaturated hydrocarbon ligand (L), having at least six cyclic carbon atoms, said cycle being unsubstituted or substituted by one or more substitution groups selected from linear or branched alkyl groups having from one to six carbon atoms unsubstituted or substituted by one or more radicals selected from fluoro, hydroxy or amino, linear or branched alkylamide groups having from one to six carbon atoms, linear or branched alkoxy groups having from one to six carbon atoms, linear or branched alkyl amidinates having from one to six carbon atoms, and
- X is either a non aromatic cyclic unsaturated hydrocarbon ligand identical or different from (L), having at least six cyclic carbon atoms said cycle being unsubstituted or substituted by one or more substitution groups selected from linear or branched alkyl groups having from one to six carbon atoms unsubstituted or substituted by one or more radicals selected from fluoro, hydroxy or amino, linear or branched alkylamide groups having from one to six carbon atoms, linear or branched alkoxy groups having from one to six carbon atoms, linear or branched alkyl amidinates having from one to six carbon atoms, or a cyclic or acyclic conjugated alkadienyl hydrocarbon ligand having from five to ten carbons atoms, said hydrocarbon ligand being unsubstituted or substituted by one or more substitution groups selected from linear or branched alkyl groups having from one to six carbon atoms unsubstituted or substituted by one or more radicals selected from fluoro, hydroxy or amino, linear or branched alkylamides group having from one to six carbon atoms, linear or branched alkoxy groups having from one to six carbon atoms, linear or branched alkyl amidinates having from one to six carbon atoms;
- c) decomposing or adsorbing on the substrate(s) said at least one organo-metallic compound into the said reactor set at a temperature equal or higher than 100° C.;
- and
- d) depositing said ruthenium containing film onto said at least one substrate.
Dependencies are inferred from the claim text.