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US 8,557,046 B2Granted
Deposition source
AssigneeSamsung Display Co., Ltd.
InventorsJong-Woo Lee, Tae-Seung Kim, Chang-Soon Ji, Won-Seok Cho, Hey-Yeon Shim, Yong-Hun Jo, Sang-Jin Han
Life of this patent
Estimating the term…
Abstract
A deposition source capable of uniformly producing a deposition film. The deposition source includes a furnace, a first heating unit surrounding the furnace to heat the furnace and a second heating unit spaced-apart from the first heating unit by an interval and surrounding the furnace to heat the furnace, wherein the second heating unit comprises a plurality of separate sub-heating units that surround the furnace.
Claims15
A deposition source comprising:
- a furnace;
- a first heating unit surrounding the furnace to heat the furnace;
- and
- a second heating unit spaced-apart from the first heating unit by an interval and surrounding the furnace to heat the furnace,
- wherein the second heating unit comprises a plurality of separate sub-heating units that surround the furnace, wherein the deposition source is a linear-type deposition source having a length much longer than a width, wherein the first heating unit is integrally formed without being divided and extends around an outer circumference of the furnace, and wherein the second heating unit includes first and second sub-heating units spaced apart from each other, the first sub-heating unit surrounds a left outer circumference of the furnace and the second sub-heating unit surrounds a right outer circumference of the furnace.
2 more elements
A deposition device, comprising:
- a vacuum chamber;
- a substrate arranged at one end of the chamber;
- a linear-type deposition source having a length much longer than a width, being arranged at an opposite end of the chamber and including:
- a furnace;
- a first heating unit surrounding an outer circumference of the furnace to heat the furnace;
- and
- a second heating unit spaced-apart from the first heating unit by an interval and surrounding the outer circumference of the furnace to heat the furnace, wherein the second heating unit comprises a plurality of separate sub-heating units that surround portions of the furnace;
- and
- a moving unit to move the deposition source within the chamber relative to the substrate, the furnace having first through fourth sidewalls, the first and third sidewalls being opposite to each other and corresponding to the length of the deposition source, and the second and fourth sidewalls being opposite to each other, corresponding to the width of the deposition source and extending from the first sidewall to the third sidewall, the first heating unit being arranged on and extending a length of each of the first through fourth sidewalls, the second heating unit includes first and second sub-heating units spaced apart from each other, the first sub-heating unit of the second heating unit being arranged on the second sidewall and on portions of the first and third sidewalls that are closer to the second sidewall than to the fourth sidewall, the second sub-heating unit being arranged on the fourth sidewall and on portions of the first and third sidewalls that are closer to the fourth sidewall than to the second sidewall.
6 more elements
Dependencies are inferred from the claim text.