Mask making with error recognition

A method of fabricating a mask, comprising:

• receiving an IC design layout data having a main feature;
• applying a logic operation (LOP) correction on the main feature of the received IC design layout data to produce a first image;
• performing an optical proximity correction (OPC) on the first image to produce a second image;
• fracturing the second image to produce a fractured second image;
• performing, by using a computer, a pattern XOR operation on the first image and the fractured second image to determine if a first error occurred, wherein the first error is determined by determining whether a difference between the fractured second image of the main feature and the first image of the main feature is greater than an predetermined dimensional value;
• inserting a backbone on the main feature to produce a third image;
• determining a second error by performing a pattern MINUS operation on the fractured second image and the third image, wherein the second error is determined by identifying a portion of the main feature that is not present in one of the fractured second image and the third image;
• and
• if neither a first or second error occurred, writing the second image onto a mask.

A method for making a mask, comprising:

• receiving a design layout having a plurality of main features;
• inserting a backbone on one main feature from the plurality of main features to produce a first image;
• performing optical proximity correction (OPC) on the one main feature from the plurality of main features to produce a second image;
• performing, by using a computer, an XOR operation on the first and second images to produce a resulting image, the resulting image representing whether the one main feature from the plurality of main features from the first image is present in the second image, wherein when the one main feature from the plurality of main features from the first image is not present in the second image the resulting image includes the inserted backbone on the one main feature;
• determining if the backbone exists in the resulting image;
• and
• if the backbone does not exists in the resulting image, making the mask with the second image.