Lithographic apparatus, coverplate and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsRaymond Wilhelmus Louis Lafarre, Nicolaas Ten Kate, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns
Life of this patent
Estimating the term…
Abstract
A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.
Claims17
A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate;
- a positioner configured to position the substrate table relative to a projection system, the positioner comprising a short stroke module configured to perform fine position movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse position movements;
- and
- a coverplate configured to at least partly cover a top surface of the short stroke module;
- wherein the coverplate is mounted to the long stroke module.
A device manufacturing method comprising:
- holding a substrate on a substrate table;
- positioning the substrate table relative to a projection system using a positioner comprising a short stroke module for fine positioning movements, on which the substrate table is held;
- supporting the short stroke module on a long stroke module for coarse positioning movements;
- and
- covering at least partly a top surface of the short stroke module using a coverplate mounted to the long stroke module.
Dependencies are inferred from the claim text.