Exposure apparatus

An exposure apparatus comprising:

• a radiation system configured to supply a projection beam of radiation;
• a patterning device configured to pattern the projection beam according to a desired pattern;
• a substrate table having an area configured to support a substrate;
• and
• a projection system configured to project the patterned beam onto a target portion of the substrate,
• wherein an immersion liquid is provided to fill a space between the projection system and the substrate during use of the apparatus, and
• wherein a part of the projection system and/or a part of the substrate table that during use of the apparatus is exposed to radiation and to the immersion liquid is coated with a photocatalytic hydrophilic coating.

An exposure apparatus comprising:

• a radiation system configured to supply a projection beam of radiation;
• a patterning device configured to pattern the projection beam according to a desired pattern;
• a substrate table having an area configured to support a substrate;
• and
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• wherein an immersion liquid is provided to fill a space between the projection system and the substrate during use of the apparatus, and
• wherein a part of the substrate table that during use of the apparatus is exposed to radiation and to the immersion liquid is coated with a hydrophilic coating configured to prevent formation of droplets of the immersion liquid, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.