Tertiary alcohol derivative, polymer compound and photoresist composition

Abstract

A polymer compound for a photoresist composition (a) having a high dissolution rate in a developing solution after exposure and (b) exhibiting little swelling during development. A tertiary alcohol derivative that is a raw material for the polymer compound. A tertiary alcohol that is an intermediate of the tertiary alcohol derivative. The tertiary alcohol is represented by formula (3): wherein R1 and R2 individually represent a linear, branched or cyclic alkylene group having 2 to 9 carbon atoms, which may contain an oxygen atom, and wherein R1 and R2 may together form a ring with a carbon atom to which R1 and R2 are bonded.

Dependencies are inferred from the claim text.