US 8,541,529 B2 · Positive resist composition, method of forming resist pattern, and polymeric compound

Abstract

A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.

Claims6

Dependent claims

A polymeric compound comprising a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group,

wherein the amount of the structural unit (a0) within the polymeric compound based on the combined total of all structural units constituting the polymeric compound is 1 to 60 mol %:
wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
R2 represents a divalent linking group;
and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

13/454,399Filed 24 Apr 2012 · continuation

Priority

JP P2008-21468822 Aug 2008

Published

US 2012/0202151 A19 Aug 2012

Granted

24 Sep 2013

Term ends

Not estimatedThe source records don’t support an estimate.

Classification9 codes

G03F 7/2041
Exposure; Apparatus therefor: in the presence of a fluid, e.g. immersion; using fluid cooling means
C08F 28/06
Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond,…
C08F 220/281
Containing no aromatic rings in the alcohol moiety: and containing only one oxygen, e.g. furfuryl acrylate or 2-methoxyethyl acrylate
C08F 220/283
Containing no aromatic rings in the alcohol moiety: and containing one or more carboxylic moiety in the chain, e.g. acetoacetoxyethylacrylate

Family

Application12/461,687Parent of this continuation · filed 20 Aug 2009

US 2012/0202151 A1Pre-grant publication · published 9 Aug 2012

US 8,192,915 B2Parent of this continuation

US 2010/0062369 A1Published application

US 8,541,529 B2This patent

From the US filing history. Foreign family members aren’t listed.

Positive resist composition, method of forming resist pattern, and polymeric compound

Life of this patent

Positive resist composition, method of forming resist pattern, and polymeric compound

Life of this patent

Abstract

Claims6