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AssigneePromerus, LLC
InventorsPramod Kandanarachchi, Kazuyoshi Fujita, Steven Smith, Larry F. Rhodes
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Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.
A non-self imageable polymer comprising norbornene-type repeating units selected from the group consisting of:
A non-self imageable homopolymer consisting of a norbornene-type repeating unit, wherein the repeating units of the polymer are one of the structural formulae selected from the group consisting of:
Dependencies are inferred from the claim text.