Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III),
• (B) a compound capable of generating a fluorine atom-containing sulfonic acid upon irradiation with an actinic ray or radiation, and
• (B′) a compound capable of generating a fluorine atom-free sulfonic acid upon irradiation with an actinic ray or radiation:
• wherein
• each of R1 and R11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and
• R12 represents a phenyl group which may have a substituent,
• wherein the content of the component (B) is from 1.0 to 15 mass %, and the content of the component (B′) is from 0.5 to 3 mass %, based on the entire solids content of the composition.